💎 Flagship · Type IIa

Diamond Semiconductor Substrates

Single crystal (SCD) and polycrystalline (PCD) CVD diamond wafers for next-generation power electronics, GaN-on-Diamond transistors, and epitaxial growth. The only substrate with 2200 W/m·K thermal conductivity and 5.47 eV bandgap.

2200 W/m·K
SCD Conductivity
5.47 eV
Bandgap
Ra <5 nm
Surface Finish
4-inch
Max PCD Diameter
Technical Specifications

Full datasheet.

Thermal Conductivity1,800 – 2,200 W/m·K
Bandgap5.47 eV
Carrier TypeUndoped (intrinsic), p-type (boron)
Crystal Orientation(100), (110), (111)
Maximum Plate SizeUp to 25 × 25 mm
Thickness Range0.3 – 2.0 mm
Surface Roughness (Ra)<5 nm (epi-ready polished)
Dislocation Density<10⁴ cm⁻²
Nitrogen Content<1 ppm (Type IIa)
BirefringenceLow stress — <100 nm/cm
Electrical Resistivity>10¹² Ω·cm (undoped)
Included CharacterizationRaman, FTIR, AFM, birefringence
Thermal Conductivity1,200 – 1,800 W/m·K
Available Diameters1", 2", 3", 4"
Thickness Range0.3 – 1.5 mm
Surface Roughness (Ra)<10 nm (polished face)
Grain Size (surface)1 – 50 µm depending on thickness
Bow/Warp<15 µm per 2" wafer
Fracture Toughness8 – 9 MPa·m½
sp³ Content>99.5% (Raman verified)
Crystal Purity (¹²C)Natural isotopic abundance
Surface OptionsLapped · Polished · Laser-diced
ApplicationsGaN-on-Diamond, RF spreaders, heat management
Included CharacterizationThermal map, Raman, thickness map
Use Cases

Built for extreme performance.

GaN-on-Diamond Transistors
PCD wafers as the thermal substrate for GaN epitaxy. GaN-on-Diamond achieves 3× higher power density vs GaN-on-SiC by eliminating the thermal bottleneck at the substrate interface.
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Power Electronics
SCD substrates for high-voltage diamond Schottky diodes and MESFETs operating above 400°C junction temperature — beyond the reach of any WBG semiconductor.
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RF / Microwave Devices
Ultra-low loss tangent (tan δ <10⁻⁴) and high thermal conductivity make diamond substrates ideal for high-power mm-wave front-end modules and passive RF components.
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Epitaxial Growth Platform
Epi-ready polished SCD wafers (Ra <1 nm) for homoepitaxial diamond growth and heteroepitaxial Ir/SCD stacks used in next-generation quantum processor fabrication.
Available Formats

Standard sizes & wafer formats.

All formats ship within 3 weeks. Custom sizes available with 1–2 week additional lead time.

SCD
3 × 3 mm
Prototype — in stock
SCD
5 × 5 mm
Standard — in stock
SCD
15 × 15 mm
Large plate — 2–3 wk
SCD
25 × 25 mm
Maximum SCD size
PCD
1" wafer
Entry PCD format
PCD
3" wafer
Production format
PCD
4" wafer
Largest PCD available
Every Wafer Ships With

Full characterization.
No surprises.

Diamond substrates from Karia come with the documentation your process and quality team needs — first time, every time.

Certificate of Analysis with measured thermal conductivity (SCD) or thermal map (PCD)
Raman spectroscopy confirming sp³ content, crystal quality, and stress map
FTIR nitrogen measurement verifying Type IIa classification (SCD)
AFM surface roughness report at multiple points across the polished face
Thickness map with point-to-point uniformity across wafer diameter
Dimensional report with bow, warp, and TTV measurement (PCD wafers)
Get Your Substrates

SCD or PCD? We'll help you choose.

Tell us your application, target size, and quantity. Our team responds within 24 hours with a recommendation and quote.